Re-structuring of glass surface by ion post-embedding for transmission
Inspired by ion-exchange technology as a means to chemical strengthening glass, alkali ions (K +) were, herein, superficially embedded into photovoltaic (PV) glass under certain thermal
EP3209623A1
The invention concerns a process for increasing the scratch resistance of a glass substrate by implantation of simple charge and multicharge ions, comprising maintaining the temperature of...
Final Report for DOE 3 11 2011
Our approach involved ion implantation of a range of glass substrates, including low iron soda-lime glass commonly used in flat plate modules, borosilicate glass used in some concentrator
Mesoporous bioactive glass-coated 3D printed
In this study, we prepared synthetic biomedical materials based on borosilicate bioactive glass (BG) and coated the surface of the BG scaffold with MBG by the
Investigation of single step Co-anneal of ion implanted boron and
Article: Investigation of single step Co-anneal of ion implanted boron and phosphorous to fabricate N-type front junction solar cells
62-1: Large-Area Ion Implantation Source for Production of Anti
In this paper, we demonstrate application of this ion source towards the production of glass and sapphire substrates with durable broadband anti-reflection surfaces with reflectance <0.5%
Ion Implantation for Enhanced Glass Properties
As industries demand more durable, high-performance glass, ion implantation provides a cost-effective and long-lasting solution for automotive displays, solar
Special glass components used in ion implantation
The ion implantation process imposes strict requirements on the radiation resistance, insulation, and chemical stability of special glass components in high-energy ion beams (10-200keV)
Effect of ion implantation on physical, optical properties and gamma
During ion implantation, the depth of ion penetration into the glass is influenced by several factors, including the parameters of the ions (such as beam energy and mass), as well as the
DFT electronic structure investigation of chromium ion-implanted
Thin films of CuO were deposited on silicon and glass substrates using reactive magnetron sputtering. Chromium was introduced via ion implantation, and samples were annealed to
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